Design a Slit HDP Semiconductor Plasma Dry Etcher by Kung Linliu
English | 2020 | ISBN: N/A | ASIN: B08N1CZHWZ | 83 pages | EPUB | 1.22 Mb
In order to overcome the difficulties of the manufacturing procedures, the novel concept of slit shape HDP plasma dry etching of metal roller from semiconductor IC process is proposed and applied to a patent.
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